Mirra MESA CMP 200mm Contour Head

APPLICATIONS
  • 200mm Planarization Contour head
  • Apply for Silicon, shallow trench isolation (STI), oxide polysilicon, tungsten and copper damascene applications
FEATURES & BENEFITS
  • High speed planarizing platens
  • Multi-zone polishing heads available ( 1~4 Zones)
  • Superior uniformity & efficiency with low downforce.
Mirra MESA CMP 200mm Contour Head