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Mirra MESA CMP 200mm Contour Head
APPLICATIONS
- 200mm Planarization Contour head
- Apply for Silicon, shallow trench isolation (STI), oxide
polysilicon, tungsten and copper damascene applications
FEATURES & BENEFITS
- High speed planarizing platens
- Multi-zone polishing heads available ( 1~4 Zones)
- Superior uniformity & efficiency with low downforce.